Rule-based Directed Self-assembly of Circuit-like Block copolymer Patterns

Templated self-assembly of block copolymers using topographic templates is attractive because it can generate dense nanoscale patterns over a large area with a periodicity down to 10 nm. In our previous work, regular patterns were achieved by using a polystyrene-bpolydimethylsiloxane (PS-b-PDMS) block copolymer and topographic templates . However, more complex block-copolymer patterns required similarly complex templates. As a result, a complex circuit‐layout pattern over a large area can only be achieved using a template with many different and non-periodic features.